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Proceedings Paper

Dynamic sampling for advanced overlay process control
Author(s): Chan Hoon Park; H. T. Kang; HongSeok Kim; MoonSang Lee; Jangho Shin; Anat Marchelli; Amir Widmann; John Charles Robinson; SeungHoon Yoon
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Paper Details

Date Published:
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Proc. SPIE 6518, Metrology, Inspection, and Process Control for Microlithography XXI, 651830; doi: 10.1117/12.712881
Show Author Affiliations
Chan Hoon Park, SAMSUNG Electronics Co., Ltd. (South Korea)
H. T. Kang, SAMSUNG Electronics Co., Ltd. (South Korea)
HongSeok Kim, SAMSUNG Electronics Co., Ltd. (South Korea)
MoonSang Lee, SAMSUNG Electronics Co., Ltd. (South Korea)
Jangho Shin, SAMSUNG Electronics Co., Ltd. (South Korea)
Anat Marchelli, KLA-Tencor Corp. (Israel)
Amir Widmann, KLA-Tencor Corp. (United States)
John Charles Robinson, KLA-Tencor Corp. (United States)
SeungHoon Yoon, KLA-Tencor Corp. (South Korea)


Published in SPIE Proceedings Vol. 6518:
Metrology, Inspection, and Process Control for Microlithography XXI
Chas N. Archie, Editor(s)

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