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Proceedings Paper

The causes of horizontal-vertical (H-V) bias in optical lithography: dipole source errors
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Paper Abstract

Horizontal-Vertical (H-V) bias is the systematic difference in linewidth between closely located horizontally and vertically oriented resist features that, other than orientation, should be identical. There are two major causes of H-V bias: astigmatism, which causes an H-V bias that varies through focus, and illumination source errors such as telecentricity error. In this paper, the effects of simple dipole source errors upon H-V bias and placement error through focus are explored through simulation.

Paper Details

Date Published: 26 March 2007
PDF: 18 pages
Proc. SPIE 6520, Optical Microlithography XX, 65203V (26 March 2007); doi: 10.1117/12.712864
Show Author Affiliations
John J. Biafore, KLA-Tencor Corp. (United States)
Chris A. Mack, Lithoguru.com (United States)
Stewart A. Robertson, KLA-Tencor Corp. (United States)
Mark D. Smith, KLA-Tencor Corp. (United States)
Sanjay Kapasi, KLA-Tencor Corp. (United States)


Published in SPIE Proceedings Vol. 6520:
Optical Microlithography XX
Donis G. Flagello, Editor(s)

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