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Proceedings Paper

High-accuracy EUV reflectometer
Author(s): U. Hinze; M. Fokoua; B. Chichkov
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Paper Abstract

Developers and users of EUV-optics need precise tools for the characterization of their products. Often a measurement accuracy of 0.1% or better is desired to detect and study slow-acting aging effect or degradation by organic contaminants. To achieve a measurement accuracy of 0.1% an EUV-source is required which provides an excellent long-time stability, namely power stability, spatial stability and spectral stability. Naturally, it should be free of debris. An EUV-source particularly suitable for this task is an advanced electron-based EUV-tube. This EUV source provides an output of up to 300 μW at 13.5 nm. Reflectometers benefit from the excellent long-time stability of this tool. We design and set up different reflectometers using EUV-tubes for the precise characterisation of EUV-optics, such as debris samples, filters, multilayer mirrors, grazing incidence optics, collectors and masks. Reflectivity measurements from grazing incidence to near normal incidence as well as transmission studies were realised at a precision of down to 0.1%. The reflectometers are computer-controlled and allow varying and scanning all important parameters online. The concepts of a sample reflectometer is discussed and results are presented. The devices can be purchased from the Laser Zentrum Hannover e.V.

Paper Details

Date Published: 21 March 2007
PDF: 4 pages
Proc. SPIE 6517, Emerging Lithographic Technologies XI, 651732 (21 March 2007); doi: 10.1117/12.712853
Show Author Affiliations
U. Hinze, Laser Zentrum Hannover e.V. (Germany)
M. Fokoua, Laser Zentrum Hannover e.V. (Germany)
B. Chichkov, Laser Zentrum Hannover e.V. (Germany)

Published in SPIE Proceedings Vol. 6517:
Emerging Lithographic Technologies XI
Michael J. Lercel, Editor(s)

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