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Etching of ZnO toward the development of ZnO homostructure LEDs
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Paper Abstract

Although ZnO has recently gained much interest as an alternative to the III-Nitride material system, the development of ZnO based optoelectonic devices is still in its infancy. Significant material breakthroughs in p-type doping of ZnO thin films and improvements in crystal growth techniques have recently been achieved, making the development of optoelectonic devices possible. ZnO is known to be an efficient UV-emitting material (~380 nm) at room temperature, optical UV lasing of ZnO has been achieved, and both homojunction and hybrid heterojunction LEDs have been demonstrated. In this paper, processing techniques are explored towards the achievement of a homo-junction ZnO LED. First, a survey of current ZnO processing methods is presented, followed by the results of our processing research. Specifically, we have examined etching through an n-ZnO layer to expose and make contact to a p-ZnO layer.

Paper Details

Date Published: 20 February 2007
PDF: 6 pages
Proc. SPIE 6474, Zinc Oxide Materials and Devices II, 64740Q (20 February 2007); doi: 10.1117/12.712784
Show Author Affiliations
Kathryn Minder, Northwestern Univ. (United States)
Ferechteh Hosseini Teherani, Nanovation SARL (France)
Dave Rogers, Nanovation SARL (France)
Univ. de Technologie de Troyes (France)
Can Bayram, Northwestern Univ. (United States)
Ryan McClintock, Northwestern Univ. (United States)
Patrick Kung, Northwestern Univ. (United States)
Manijeh Razeghi, Northwestern Univ. (United States)

Published in SPIE Proceedings Vol. 6474:
Zinc Oxide Materials and Devices II
Ferechteh Hosseini Teherani; Cole W. Litton, Editor(s)

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