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Proceedings Paper

Evaluation of the 3D compositional heterogeneity effect on line-edge-roughness
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Paper Abstract

The controlling factors in the formation of the compositional heterogeneity at the deprotection front were investigated using 3D computer simulation. The results illustrate that the chemical composition fluctuation (CCF) formed by the photoresist deprotection reaction is an important factor contributing to the line-edge-roughness (LER) in addition to the deprotection gradient (DG) of the reaction front. The magnitude of the chemical composition fluctuation and the deprotection gradient are found to depend on the ratio of the deprotection reaction rate constant to diffusion coefficient (kP/D) and the number of hoping step (n) With this new finding, the influence on LER from various process/material parameters such as dose/contrast, diffusivity, and reactivity can all be understood through their effects on kP/D and n.

Paper Details

Date Published: 22 March 2007
PDF: 10 pages
Proc. SPIE 6519, Advances in Resist Materials and Processing Technology XXIV, 65193V (22 March 2007); doi: 10.1117/12.712682
Show Author Affiliations
Shuhui Kang, National Institute of Standards and Technology (United States)
Wen-Li Wu, National Institute of Standards and Technology (United States)
Vivek M. Prabhu, National Institute of Standards and Technology (United States)
Bryan D. Vogt, National Institute of Standards and Technology (United States)
Eric K. Lin, National Institute of Standards and Technology (United States)
Karen Turnquest, SEMATECH, Inc. (United States)


Published in SPIE Proceedings Vol. 6519:
Advances in Resist Materials and Processing Technology XXIV
Qinghuang Lin, Editor(s)

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