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Proceedings Paper

Increased availability of lithography light sources using advanced gas management
Author(s): Wayne J. Dunstan; Robert Jacques; Kevin O'Brien; Aravind Ratnam
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Paper Abstract

Increasing throughput demands on leading edge scanners are requiring greatly improved light source availability. This translates directly to minimizing downtime and maximizing productive time, as defined in the SEMI E10 standard. One positive contributor to improving productive time is the minimization of the light source stoppage for entire Halogen gas replenishment. This paper describes availability improvements of Cymer XLA and 7000 series light sources by using advanced gas management schemes to minimize entire gas replenishment impact to productive time. Recent augmented gas control algorithms have demonstrated multiple times extension of gas life through advanced gas replenishment methods and higher performance estimators. Along with these improvements to gas management, major efforts in light source fault reduction, module lifetime extension and optimization of module replacement, will provide significantly increased combined light source\scanner availability.

Paper Details

Date Published: 26 March 2007
PDF: 8 pages
Proc. SPIE 6520, Optical Microlithography XX, 652032 (26 March 2007); doi: 10.1117/12.712681
Show Author Affiliations
Wayne J. Dunstan, Cymer, Inc. (United States)
Robert Jacques, Cymer, Inc. (United States)
Kevin O'Brien, Cymer, Inc. (United States)
Aravind Ratnam, Cymer, Inc. (United States)

Published in SPIE Proceedings Vol. 6520:
Optical Microlithography XX
Donis G. Flagello, Editor(s)

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