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Proceedings Paper

Design of metal slits for higher harmonic fringe patterns generated with surface plasmon interference lithography
Author(s): Yunmi Lee; Sinjeung Park; Eungman Lee; Kyoungsik Kim; Jae W. Hahn
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Paper Abstract

In this paper, based on numerical study using the finite difference time domain method, we designed metal slits for higher harmonic fringe patterns generated with surface plasmon interference lithography. The slits were designed to generate higher fringe patterns having high intensity output, high contrast and good uniformity in sub-100nm scale. After fabricating several types of slits on aluminum film mask according to the calculated designs with a focused ion beam facility, lithography experiments using the aluminum slits were performed to record the near-filed fringe patterns using i-line Hg lamp and SU-8 negative photoresist.

Paper Details

Date Published: 15 March 2007
PDF: 6 pages
Proc. SPIE 6517, Emerging Lithographic Technologies XI, 651722 (15 March 2007); doi: 10.1117/12.712522
Show Author Affiliations
Yunmi Lee, Yonsei Univ. (South Korea)
Sinjeung Park, Yonsei Univ. (South Korea)
Eungman Lee, Yonsei Univ. (South Korea)
Kyoungsik Kim, Yonsei Univ. (South Korea)
Jae W. Hahn, Yonsei Univ. (South Korea)


Published in SPIE Proceedings Vol. 6517:
Emerging Lithographic Technologies XI
Michael J. Lercel, Editor(s)

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