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Proceedings Paper

Visible light angular scatterometry for nanolithography
Author(s): Rayan M. Al-Assaad; Li Tao; Wenchuang Hu
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Paper Abstract

Visible light angular scatterometry is investigated for sub-100 nm line metrology. Measurement sensitivities to small variations in line dimensions are examined and some observations are made on the measurement conditions leading to improved sensitivities even for 20 nm CD. Experimental results with good accuracies are also shown for red light angular measurements of PMMA gratings made by e-beam lithography and nanoimprint lithography. The theoretical and experimental studies show high sensitivity and accuracy in characterization of the geometry and dimensions of nano-lines, particularly in measuring the polymer residue thickness of nanoimprinted polymer gratings and the undercut line profiles resulting from e-beam lithography. The results promote using this low cost and non-invasive technique to examine and control some underlying lithographic processes in nanofabrication.

Paper Details

Date Published: 5 April 2007
PDF: 10 pages
Proc. SPIE 6518, Metrology, Inspection, and Process Control for Microlithography XXI, 651839 (5 April 2007); doi: 10.1117/12.712486
Show Author Affiliations
Rayan M. Al-Assaad, The Univ. of Texas at Dallas (United States)
Li Tao, The Univ. of Texas at Dallas (United States)
Wenchuang Hu, The Univ. of Texas at Dallas (United States)


Published in SPIE Proceedings Vol. 6518:
Metrology, Inspection, and Process Control for Microlithography XXI
Chas N. Archie, Editor(s)

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