Share Email Print
cover

Proceedings Paper

Evaluating a scatterometry-based focus monitor technique for hyper-NA lithography
Author(s): Chandra Saru Saravanan; Srinivasan Nirmalgandhi; Oleg Kritsun; Alden Acheta; Richard Sandberg; Bruno La Fontaine; Harry J. Levinson; Kevin Lensing; Mircea Dusa; Jan Hauschild; Anita Pici
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

This paper discusses the use of scatterometry for scanner focus control in hyper-NA lithography. A variety of techniques based on phase shift technology have been traditionally used to monitor scanner focus. Recently scatterometry has offered significant promise as an alternate technique to monitor both focus and dose. In this study, we make careful comparisons of a Scatterometry-based Focus-Dose Monitoring (SFDM) technique to Phase-grating Focus Monitoring (PGFM). We discuss the operating principles of these techniques and compare the sensitivity of SFDM to PGFM. In addition, the variation observed in characterizing intra-field and across-wafer behavior of a hyper-NA immersion scanner is described when using these different techniques.

Paper Details

Date Published: 4 April 2007
PDF: 12 pages
Proc. SPIE 6518, Metrology, Inspection, and Process Control for Microlithography XXI, 651806 (4 April 2007); doi: 10.1117/12.712470
Show Author Affiliations
Chandra Saru Saravanan, Nanometrics, Inc. (United States)
Srinivasan Nirmalgandhi, Nanometrics, Inc. (United States)
Oleg Kritsun, AMD (United States)
Alden Acheta, AMD (United States)
Richard Sandberg, AMD (United States)
Bruno La Fontaine, AMD (United States)
Harry J. Levinson, AMD (United States)
Kevin Lensing, AMD (United States)
Mircea Dusa, ASML US, Inc. (United States)
Jan Hauschild, ASML US, Inc. (United States)
Anita Pici, ASML US, Inc. (United States)


Published in SPIE Proceedings Vol. 6518:
Metrology, Inspection, and Process Control for Microlithography XXI
Chas N. Archie, Editor(s)

© SPIE. Terms of Use
Back to Top