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Proceedings Paper

Lithography simulation in DfM: achievable accuracy versus requirements
Author(s): Scott Mansfield; Ioana Graur; Geng Han; Jason Meiring; Lars Liebmann; Dureseti Chidambarrao
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Paper Abstract

Lithography simulation remains one of the primary aspects of most DfM flows, along with critical area analysis and chem-mech-polish (CMP) modeling. Often, the accuracy of the DfM flow is judged solely on the accuracy of the lithographic simulation. In this paper we attempt to refute that viewpoint and highlight the many sources of error in a DfM flow. We examine the factors that impact accuracy and attempt to quantify their effect. Differences between rigorous simulation, which includes full mask data preparation along with lithography simulation, and the use of compact models are explored. Required and achievable DfM accuracy over time and across multiple fabs is examined and the use of a "closed-loop" DfM flow is proposed.

Paper Details

Date Published: 21 March 2007
PDF: 11 pages
Proc. SPIE 6521, Design for Manufacturability through Design-Process Integration, 652106 (21 March 2007); doi: 10.1117/12.712437
Show Author Affiliations
Scott Mansfield, IBM (United States)
Ioana Graur, IBM (United States)
Geng Han, IBM (United States)
Jason Meiring, IBM (United States)
Lars Liebmann, IBM (United States)
Dureseti Chidambarrao, IBM (United States)


Published in SPIE Proceedings Vol. 6521:
Design for Manufacturability through Design-Process Integration
Alfred K.K. Wong; Vivek K. Singh, Editor(s)

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