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Proceedings Paper

Models for predicting the index of refraction of compounds at 193 and 589 nm
Author(s): Robert L. Brainard; Seth Kruger; Eric Block
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Paper Abstract

A simple empirical model is presented that predicts the index of refraction at 589 nm (D-line) and 193 nm for molecules based solely on chemical structure. The model was built by comparing literature values of refractive indices (sodium D-line 589 nm) of compounds with representative functionalities and has 18 adjustable parameters. Published values for nD and n193 were used to extrapolate the predictions from values of nD to values of n193. These simple, accessible models can be run using only Excel software on a laptop computer.

Paper Details

Date Published: 22 March 2007
PDF: 7 pages
Proc. SPIE 6519, Advances in Resist Materials and Processing Technology XXIV, 651920 (22 March 2007); doi: 10.1117/12.712431
Show Author Affiliations
Robert L. Brainard, Univ. at Albany, SUNY (United States)
Seth Kruger, Univ. at Albany, SUNY (United States)
Eric Block, Univ. at Albany, SUNY (United States)

Published in SPIE Proceedings Vol. 6519:
Advances in Resist Materials and Processing Technology XXIV
Qinghuang Lin, Editor(s)

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