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Proceedings Paper

Optimization of material and process parameter for minimizing defect in implementation of MFHM process
Author(s): Kilyoung Lee; Junggun Heo; Keundo Ban; Hyungsuk Seo; Geunsu Lee; Wonkyu Kim; Junhee Cho; Junhyeub Sun; Sungkwon Lee; Cheolkyu Bok; Seungchan Moon; Jinwoong Kim
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Paper Abstract

Silicon-containing material has recently attracted attention as new hard mask material. We have studied the applicability of MFHM (Multi-Functional Hard Mask)/SOC (Spin on Carbon) materials as an alternative to the BARC/SiON/ amorphous carbon (a-C) process. This process is very useful in terms of cost reduction and process simplicity compared to a-C process. Evaluation results have showed good lithographic and etch performances. However, this MFHM process has showed specific defects related to material. This paper will focus on defect type and suggest its solution.

Paper Details

Date Published: 30 March 2007
PDF: 8 pages
Proc. SPIE 6519, Advances in Resist Materials and Processing Technology XXIV, 65192Y (30 March 2007); doi: 10.1117/12.712406
Show Author Affiliations
Kilyoung Lee, Hynix Semiconductor Inc. (South Korea)
Junggun Heo, Hynix Semiconductor Inc. (South Korea)
Keundo Ban, Hynix Semiconductor Inc. (South Korea)
Hyungsuk Seo, Hynix Semiconductor Inc. (South Korea)
Geunsu Lee, Hynix Semiconductor Inc. (South Korea)
Wonkyu Kim, Hynix Semiconductor Inc. (South Korea)
Junhee Cho, Hynix Semiconductor Inc. (South Korea)
Junhyeub Sun, Hynix Semiconductor Inc. (South Korea)
Sungkwon Lee, Hynix Semiconductor Inc. (South Korea)
Cheolkyu Bok, Hynix Semiconductor Inc. (South Korea)
Seungchan Moon, Hynix Semiconductor Inc. (South Korea)
Jinwoong Kim, Hynix Semiconductor Inc. (South Korea)


Published in SPIE Proceedings Vol. 6519:
Advances in Resist Materials and Processing Technology XXIV
Qinghuang Lin, Editor(s)

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