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Proceedings Paper

Scissionable bile acid nanostructures for lithography
Author(s): Robert P. Meagley; Geeta Sharma; Ankur Guptab
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Paper Abstract

Pixelated photoresists, i.e. resists that compartmentalize photochemistry into discrete imaging elements are an emerging design for improved resolution. A pixelated design seeks to overcome chaotic organization in complex resist formulations through application of small regular or symmetric imaging species, and/or through the application of preorganization of resist components. [1] Another approach, backbone scission, has also emerged as a powerful method to improve resist performance. [2] In this approach, the parts of the resist structure that have undergone radiation driven chemistry are disconnected from the unaffected material. This enhances contrast and also confers an additional mechanism: structural disruption. Bile acids have been used recently as building blocks to enable host-guest chemistry [3] and have been incorporated as additives in photoresists [4] and structural elements [5]. They as a class are fairly large (mw ~400) highly functionalized molecules possessing a hydrophobic face, alcohol groups and a carboxylic acid group. We describe here a scissionable pixelated resist architecture based on bile acids bound by acid-sensitive tertiary ester linkages into dendrimeric arrays. This design seeks to employ structural disintegration and catalyst pre-organization in addition to solubility switching as contrast mechanisms. Preliminary EUV and ebeam studies have shown G0 and G1 materials capable of sub-micron imaging.

Paper Details

Date Published: 19 March 2007
PDF: 9 pages
Proc. SPIE 6517, Emerging Lithographic Technologies XI, 65171J (19 March 2007); doi: 10.1117/12.712355
Show Author Affiliations
Robert P. Meagley, Lawrence Berkeley National Lab. (United States)
Intel Corp. (United States)
Geeta Sharma, Intel Corp. (United States)
Ankur Guptab, Lawrence Berkeley National Lab. (United States)
Intel Corp. (United States)

Published in SPIE Proceedings Vol. 6517:
Emerging Lithographic Technologies XI
Michael J. Lercel, Editor(s)

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