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Proceedings Paper

Scatterometry for photolithography in high-volume manufacturing
Author(s): Naren Yellai; Zhao Zhang
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Date Published:
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Proc. SPIE 6518, Metrology, Inspection, and Process Control for Microlithography XXI, ; doi: 10.1117/12.712349
Show Author Affiliations
Naren Yellai, Nova Measuring Instruments Inc. (United States)
Zhao Zhang, Micron Technology, Inc. (United States)


Published in SPIE Proceedings Vol. 6518:
Metrology, Inspection, and Process Control for Microlithography XXI
Chas N. Archie, Editor(s)

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