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Proceedings Paper

Holographic optical elements for the extreme-ultraviolet regime
Author(s): Patrick P. Naulleau; Farhad Salmassi; Eric M. Gullikson; Erik H. Anderson
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Paper Abstract

As the development of extreme ultraviolet (EUV) lithography progresses, interest grows in the extension of traditional optical components to the EUV regime. The strong absorption of EUV by most materials and its extremely short wavelength, however, makes it very difficult to implement many components that are commonplace in the longer wavelength regimes. One such component is the diffractive optical element used, for example, in illumination systems to efficiently generate modified pupil fills. Here we demonstrate the fabrication and characterization of EUV binary phase-only computer-generated holograms allowing arbitrary far-field diffraction patterns to be generated.

Paper Details

Date Published: 8 February 2007
PDF: 6 pages
Proc. SPIE 6462, Micromachining Technology for Micro-Optics and Nano-Optics V and Microfabrication Process Technology XII, 64620S (8 February 2007); doi: 10.1117/12.712345
Show Author Affiliations
Patrick P. Naulleau, Lawrence Berkeley National Lab. (United States)
Farhad Salmassi, Lawrence Berkeley National Lab. (United States)
Eric M. Gullikson, Lawrence Berkeley National Lab. (United States)
Erik H. Anderson, Lawrence Berkeley National Lab. (United States)


Published in SPIE Proceedings Vol. 6462:
Micromachining Technology for Micro-Optics and Nano-Optics V and Microfabrication Process Technology XII
Mary-Ann Maher; Thomas J. Suleski; Eric G. Johnson; Harold D. Stewart; Jung-Chih Chiao; Gregory P. Nordin, Editor(s)

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