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Proceedings Paper

Application of carbon nanotube probes in a critical dimension atomic force microscope
Author(s): B. C. Park; J. Choi; S. J. Ahn; D-H Kim; J. Lyou; R. Dixson; N. G. Orji; J. Fu; T. V. Vorburger
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Paper Abstract

The ever decreasing size of semiconductor features demands the advancement of critical dimension atomic force microscope (CD-AFM) technology, for which the fabrication and use of more ideal probes like carbon nanotubes (CNT) is of considerable interest. The recent progress in the precise control of CNT orientation, length, and end modification, using manipulation and focused ion beam processes, allowed us to implement ball-capped CNT tips and bent CNT tips for CD-AFM. Such CNT tips have been tested for the first time in a commercial CD-AFM to image a grating and line edge roughness samples. We found out that CNT tips can reasonably scan the pattern profiles including re-entrant sidewalls with the CNT tip geometries we used and with the available range of scan parameters. There still remain important issues to address - including tighter control of tip geometry and optimization of scan parameters and algorithms for using CNT tips.

Paper Details

Date Published: 5 April 2007
PDF: 14 pages
Proc. SPIE 6518, Metrology, Inspection, and Process Control for Microlithography XXI, 651819 (5 April 2007); doi: 10.1117/12.712326
Show Author Affiliations
B. C. Park, Korea Research Institute of Standards and Science (South Korea)
J. Choi, Korea Research Institute of Standards and Science (South Korea)
Chungnam National Univ. (South Korea)
S. J. Ahn, Korea Research Institute of Standards and Science (South Korea)
D-H Kim, Korea Research Institute of Standards and Science (South Korea)
J. Lyou, Chungnam National Univ. (South Korea)
R. Dixson, National Institute of Standards and Technology (United States)
N. G. Orji, National Institute of Standards and Technology (United States)
J. Fu, National Institute of Standards and Technology (United States)
T. V. Vorburger, National Institute of Standards and Technology (United States)


Published in SPIE Proceedings Vol. 6518:
Metrology, Inspection, and Process Control for Microlithography XXI
Chas N. Archie, Editor(s)

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