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Proceedings Paper

Direct measurement of the in-situ developed latent image: the residual swelling fraction
Author(s): Vivek M. Prabhu; Bryan D. Vogt; Shuhui Kang; Ashwin Rao; Eric K. Lin; Sushil K. Satija; Karen Turnquest
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Paper Abstract

The spatial distribution of polymer photoresist and deuterium labeled developer highlights a fraction of material at a model line edge that swells, but does not dissolve. This residual swelling fraction remains swollen during both the in situ development and rinse steps uncovering that the final lithographic feature is resolved by a collapse mechanism during the drying step. We demonstrate that contrast variant neutron reflectivity provides a general method to probe the nanometer resolved in situ development and rinse process step.

Paper Details

Date Published: 22 March 2007
PDF: 12 pages
Proc. SPIE 6519, Advances in Resist Materials and Processing Technology XXIV, 651910 (22 March 2007); doi: 10.1117/12.712311
Show Author Affiliations
Vivek M. Prabhu, National Institute of Standards and Technology (United States)
Bryan D. Vogt, National Institute of Standards and Technology (United States)
Shuhui Kang, National Institute of Standards and Technology (United States)
Ashwin Rao, National Institute of Standards and Technology (United States)
Eric K. Lin, National Institute of Standards and Technology (United States)
Sushil K. Satija, National Institute of Standards and Technology (United States)
Karen Turnquest, Sematech, Inc. (United States)


Published in SPIE Proceedings Vol. 6519:
Advances in Resist Materials and Processing Technology XXIV
Qinghuang Lin, Editor(s)

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