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Proceedings Paper

Optimization of EUV laser and discharge devices for high-volume manufacturing
Author(s): A. Hassanein; V. Sizyuk; T. Sizyuk; V. Morozov
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Paper Abstract

Both Laser and Discharge produced plasma (LPP and DPP) are being used as a light source for EUV lithography. A key challenge for the EUV radiation plasma devices is achieving sufficient brightness to support the throughput requirements of High-Volume Manufacturing lithography exposure tools. One method for improving source brightness is to simulate the source environment in order to optimize the EUV output. An integrated model for the description of hydrodynamics and optical processes in DPP and LPP devices has been developed and integrated into the HEIGHTS-EUV computer simulation package. Model development consisted of several main tasks: plasma evolution and magnetohydrodynamic (MHD) processes; detailed photon radiation transport, and physics of plasma/electrode interactions in DPP devices, scattering processes of the neutral and charged particles of plasma. Advanced numerical methods for the description of magnetic compression and diffusion in 2D and 3D geometries are used in the HEIGHTS package. Radiation transport of both continuum and lines is taken into account with detailed spectral profiles in the EUV region. Monte Carlo methods are used for the modeling of the radiation transport processes, laser radiation absorption, and the debris particles behavior in magnetic field.

Paper Details

Date Published: 21 March 2007
PDF: 13 pages
Proc. SPIE 6517, Emerging Lithographic Technologies XI, 65171X (21 March 2007); doi: 10.1117/12.712300
Show Author Affiliations
A. Hassanein, Argonne National Lab. (United States)
V. Sizyuk, Argonne National Lab. (United States)
T. Sizyuk, Argonne National Lab. (United States)
V. Morozov, Argonne National Lab. (United States)


Published in SPIE Proceedings Vol. 6517:
Emerging Lithographic Technologies XI
Michael J. Lercel, Editor(s)

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