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Proceedings Paper

Photonic band-gap masks to enhance resolution and depth of focus
Author(s): John Nistler; Koby Duckworth; Jiri Chaloupka; Matt Brock
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Paper Abstract

The authors introduce initial simulation work on Photonic Bandgap Enhanced or PBE reticles that tends to address the manufacturing problems associated with typical PSM reticles while improving potential resolution capabilities to 35 and 25 nm utilizing 193 nm immersion lithography. The proposed approach for manufacturing reduces the overall defect issues associated with PSM approaches.

Paper Details

Date Published: 19 March 2007
PDF: 14 pages
Proc. SPIE 6517, Emerging Lithographic Technologies XI, 65171F (19 March 2007); doi: 10.1117/12.712295
Show Author Affiliations
John Nistler, Psida Lithography & Software LLC (United States)
Koby Duckworth, Psida Lithography & Software LLC (United States)
Jiri Chaloupka, Masaryk University (Czech Republic)
Matt Brock, Psida Lithography & Software LLC (United States)


Published in SPIE Proceedings Vol. 6517:
Emerging Lithographic Technologies XI
Michael J. Lercel, Editor(s)

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