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Application of perturbation methods in optical scatterometry
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Paper Abstract

Optical scattering techniques can provide rapid, non-destructive measurements of nanometer-scale structures for micro-fabrication process control. In general, these techniques compare measured optical characteristics of a sample to results generated from a theoretical model. The models can be computationally expensive, especially when used with iterative methods to obtain a solution to the inverse problem. However, the structures of interest are normally restricted to small changes from some nominal structure. Perturbation theories have been used to efficiently calculate the effects of small changes on the performance of photonic crystals. In this paper, we apply these perturbation techniques to the optical scatterometry problem and demonstrate a calculation of the change in the scattered signal due to edge roughness from an array of holes in a dielectric.

Paper Details

Date Published: 5 April 2007
PDF: 8 pages
Proc. SPIE 6518, Metrology, Inspection, and Process Control for Microlithography XXI, 651829 (5 April 2007); doi: 10.1117/12.712291
Show Author Affiliations
B. C. Bergner, Univ. of North Carolina, Charlotte (United States)
T. J. Suleski, Univ. of North Carolina, Charlotte (United States)

Published in SPIE Proceedings Vol. 6518:
Metrology, Inspection, and Process Control for Microlithography XXI
Chas N. Archie, Editor(s)

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