Share Email Print

Proceedings Paper

Critical parameters influencing the EUV-induced damage of Ru-capped multilayer mirrors
Author(s): S. B. Hill; I. Ermanoski; C. Tarrio; T. B. Lucatorto; T. E. Madey; S. Bajt; M. Fang; M. Chandhok
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Endurance testing of Ru-capped multilayer mirrors (MLMs) at the NIST synchrotron facility has revealed that the damage resulting from EUV irradiation in a water-dominated environment is nonlinear and may be influenced by competing oxidation and carbon-deposition processes. Concurrent results from two different environmental chambers reveal non-intuitive relationships between reflectivity loss and the admitted water-vapor partial pressure, the ambient background-gas composition, the presence or absence of hot filaments in the chamber, the EUV intensity and the irradiation dose. We discuss possible mechanisms and propose further experiments to test them. Determining the MLM lifetime from accelerated tests is a very difficult task. It is crucial that any lifetime testing procedure involves duplicate exposures for consistency, and, if possible, testing in multiple facilities.

Paper Details

Date Published: 19 March 2007
PDF: 12 pages
Proc. SPIE 6517, Emerging Lithographic Technologies XI, 65170G (19 March 2007); doi: 10.1117/12.712286
Show Author Affiliations
S. B. Hill, National Institute of Standards and Technology (United States)
I. Ermanoski, National Institute of Standards and Technology (United States)
C. Tarrio, National Institute of Standards and Technology (United States)
T. B. Lucatorto, National Institute of Standards and Technology (United States)
T. E. Madey, Rutgers Univ. (United States)
S. Bajt, Lawrence Livermore National Lab. (United States)
M. Fang, Intel Corp. (United States)
M. Chandhok, Intel Corp. (United States)

Published in SPIE Proceedings Vol. 6517:
Emerging Lithographic Technologies XI
Michael J. Lercel, Editor(s)

© SPIE. Terms of Use
Back to Top