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Proceedings Paper

Molecular-ruler nanolithography
Author(s): Charan Srinivasan; J. Nathan Hohman; Mary E. Anderson; Pengpeng Zhang; Paul S. Weiss; Mark W. Horn
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Paper Abstract

Molecular-ruler nanolithography uses individual molecules as building blocks to create nanometer-scale features in a low-cost, high-throughput process. Self-assembled multilayers are used in combination with radiation-sensitive polymeric resists to interface nanometer-scale features with structures fabricated using conventional lithographic methods. This technique is advantageous for its high precision, parallel processing, and low capital investment. Here, we provide an overview of molecular-ruler nanolithography and describe how this technology is being applied to the creation of nanometer-scale devices, patterning of large-area sub-200-nm grating structures, and the fabrication of quartz templates for use as molds in imprint lithography.

Paper Details

Date Published: 15 March 2007
PDF: 9 pages
Proc. SPIE 6517, Emerging Lithographic Technologies XI, 65171I (15 March 2007); doi: 10.1117/12.712230
Show Author Affiliations
Charan Srinivasan, The Pennsylvania State Univ. (United States)
J. Nathan Hohman, The Pennsylvania State Univ. (United States)
Mary E. Anderson, The Pennsylvania State Univ. (United States)
Pengpeng Zhang, The Pennsylvania State Univ. (United States)
Paul S. Weiss, The Pennsylvania State Univ. (United States)
Mark W. Horn, The Pennsylvania State Univ. (United States)


Published in SPIE Proceedings Vol. 6517:
Emerging Lithographic Technologies XI
Michael J. Lercel, Editor(s)

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