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Proceedings Paper

Toward standard process models for OPC
Author(s): Yuri Granik; Dmitry Medvedev; Nick Cobb
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Paper Abstract

We present description of the Compact Model 1 (CM1) resist model designed for use in OPC and OPC verification. We discuss model formulation and compare model predictions to the resist measurements. We propose to use CM1 model as a standard pattern transfer model during chip-scale process simulations.

Paper Details

Date Published: 27 March 2007
PDF: 6 pages
Proc. SPIE 6520, Optical Microlithography XX, 652043 (27 March 2007); doi: 10.1117/12.712229
Show Author Affiliations
Yuri Granik, Mentor Graphics Corp. (United States)
Dmitry Medvedev, Mentor Graphics Corp. (United States)
Nick Cobb, Mentor Graphics Corp. (United States)


Published in SPIE Proceedings Vol. 6520:
Optical Microlithography XX
Donis G. Flagello, Editor(s)

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