Share Email Print

Proceedings Paper

Sub-nanometer CD-SEM matching
Author(s): Travis Lott; Russell J. Elias
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Reducing metrology fleet variation through improved matching techniques is a never-ending journey. In exceeding vendor specifications, CD-SEM matching of < 1nm were demonstrated between two tools. Details and methods are discussed, including FOV Factor matching, automated SEM tuning, new qual sampling plans (termed 5x5x5), and a 1st difference monitoring plan for tool drift. The results obtained in this paper were collected over a year and included data before and after maintenance events (ie. Tip changes.)

Paper Details

Date Published: 5 April 2007
PDF: 11 pages
Proc. SPIE 6518, Metrology, Inspection, and Process Control for Microlithography XXI, 651838 (5 April 2007); doi: 10.1117/12.712213
Show Author Affiliations
Travis Lott, Cypress Semiconductor (United States)
Russell J. Elias, Cypress Semiconductor (United States)

Published in SPIE Proceedings Vol. 6518:
Metrology, Inspection, and Process Control for Microlithography XXI
Chas N. Archie, Editor(s)

© SPIE. Terms of Use
Back to Top