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Proceedings Paper

Sub-nanometer CD-SEM matching
Author(s): Travis Lott; Russell J. Elias
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Paper Abstract

Reducing metrology fleet variation through improved matching techniques is a never-ending journey. In exceeding vendor specifications, CD-SEM matching of < 1nm were demonstrated between two tools. Details and methods are discussed, including FOV Factor matching, automated SEM tuning, new qual sampling plans (termed 5x5x5), and a 1st difference monitoring plan for tool drift. The results obtained in this paper were collected over a year and included data before and after maintenance events (ie. Tip changes.)

Paper Details

Date Published: 5 April 2007
PDF: 11 pages
Proc. SPIE 6518, Metrology, Inspection, and Process Control for Microlithography XXI, 651838 (5 April 2007); doi: 10.1117/12.712213
Show Author Affiliations
Travis Lott, Cypress Semiconductor (United States)
Russell J. Elias, Cypress Semiconductor (United States)


Published in SPIE Proceedings Vol. 6518:
Metrology, Inspection, and Process Control for Microlithography XXI
Chas N. Archie, Editor(s)

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