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Proceedings Paper

A solid-state 193-nm laser with high spatial coherence for sub-40-nm interferometric immersion lithography
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Paper Abstract

We have developed a solid-state 193-nm laser source operating at 5-kHz that generates a near-diffraction-limited TEM00 beam with 35 mW average power. The frequency spectrum is Gaussian, with a linewidth ~7-pm (FWHM), corresponding to a coherence length of ~2-mm. The output beam also has a very high degree of spatial coherence. This source was used in an interferometric liquid-immersion lithography test stand to produce 40- and 35-nm half-pitch grating structures over a ~0.6-mm field of view with a commercially available chemically-amplified photoresist.

Paper Details

Date Published: 26 March 2007
PDF: 7 pages
Proc. SPIE 6520, Optical Microlithography XX, 65202Z (26 March 2007); doi: 10.1117/12.712210
Show Author Affiliations
Andrew J. Merriam, Actinix (United States)
Donald S. Bethune, IBM Almaden Research Ctr. (United States)
John A. Hoffnagle, IBM Almaden Research Ctr. (United States)
William D. Hinsberg, IBM Almaden Research Ctr. (United States)
C. Michael Jefferson, IBM Almaden Research Ctr. (United States)
James J. Jacob, Actinix (United States)
Timothy Litvin, Kimokeo, Inc. (United States)


Published in SPIE Proceedings Vol. 6520:
Optical Microlithography XX
Donis G. Flagello, Editor(s)

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