Share Email Print
cover

Proceedings Paper

Corning ULE glass can meet P-37 specifications
Author(s): William Rosch; Lorrie Beall; John Maxon; Robert Sabia; Robert Sell
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

Corning ULE® glass is a binary SiO2 + TiO2 composition formed directly using a flame hydrolysis process. ULE possesses a very low thermal expansion range that can also be accurately adjusted for various applications including EUV photolithography. For ULE to be used for mask blanks and optics applications, it is also necessary that the material be capable of meeting stringent flatness and roughness specifications. For ULE, small compositional striations have been shown to affect the surface quality by inducing mid-spatial frequency roughness during polishing. Therefore, the main challenge has been to reduce mid-spatial frequency roughness to an acceptably low level by diminishing compositional striations present in the glass. Recently, a combination of predictive modeling and experimentation has resulted in a process that reduces striae to the levels needed for EUV masks and optics. These models have enhanced the fundamental understanding of the glass forming process, leading to process adjustments both in oscillation patterns and additional thermal treatments producing glass with improved striae characteristics. ULE masks with reduced striae have been polished to mid-spatial frequency roughness peak-to-valley levels of less than 8 nm. This sub-8 nm topography accounts for less than 20% of the total 50 nm flatness error budget allowable for EUVL masks. These results indicate that Corning's ULE product can meet the P-37 surface finishing specifications, and combined with ULE's superior CTE performance is positioned as the material of choice for EUV mask blanks.

Paper Details

Date Published: 15 March 2007
PDF: 8 pages
Proc. SPIE 6517, Emerging Lithographic Technologies XI, 651724 (15 March 2007); doi: 10.1117/12.712160
Show Author Affiliations
William Rosch, Corning Inc. (United States)
Lorrie Beall, Corning Inc. (United States)
John Maxon, Corning Inc. (United States)
Robert Sabia, Corning Inc. (United States)
Robert Sell, Corning Inc. (United States)


Published in SPIE Proceedings Vol. 6517:
Emerging Lithographic Technologies XI
Michael J. Lercel, Editor(s)

© SPIE. Terms of Use
Back to Top