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Proceedings Paper

Exposure and compositional factors that influence polarization induced birefringence in silica glass
Author(s): Douglas C. Allan; Michal Mlejnek; Ulrich Neukirch; Charlene M. Smith; Frances M. Smith
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Paper Abstract

Silica glass exhibits a permanent anisotropic response, referred to as polarization induced birefringence (PIB), when exposed to short wavelength, polarized light. The magnitude of the PIB has been empirically correlated with the OH content of the glass. Our recent studies pertaining to PIB have focused on careful characterization of PIB, with particular emphasis on understanding all of the contributions to the measured birefringence signal and finally extracting only that signal associated with birefringence arising from exposure to a polarized light beam. We will demonstrate that a critical contributor to the total birefringence signal is birefringence that comes from exposure beam inhomogeneities. After subtracting beam profile effects we are able to show that PIB is proportional to the OH content of the glass. Polarized infrared (IR) measurements were performed on glasses that developed PIB as a consequence of exposure to polarized 157-nm light. These studies reveal that there is preferential bleaching of a specific hydroxyl (OH) species in the glass with OH aligned parallel to the incident polarization undergoing more bleaching than those perpendicular. Further, we observe a very strong correlation between the measured PIB of these samples and the anisotropic bleaching. From these studies we propose a mechanism that can explain the role of hydroxyl in PIB.

Paper Details

Date Published: 26 March 2007
PDF: 14 pages
Proc. SPIE 6520, Optical Microlithography XX, 65201Z (26 March 2007); doi: 10.1117/12.712125
Show Author Affiliations
Douglas C. Allan, Corning Inc. (United States)
Michal Mlejnek, Corning Inc. (United States)
Ulrich Neukirch, Corning Inc. (United States)
Charlene M. Smith, Corning Inc. (United States)
Frances M. Smith, Corning Inc. (United States)

Published in SPIE Proceedings Vol. 6520:
Optical Microlithography XX
Donis G. Flagello, Editor(s)

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