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Proceedings Paper

Recent progress of a character projection-type low-energy electron-beam direct writing system
Author(s): Kouhei Noguchi; Katsuhide Watanabe; Hidetoshi Kinoshita; Hiroyuki Shinozaki; Yasushi Kojima; Satoshi Morita; Fumihiko Nakamura; Norihiro Yamaguchi; Kazuhiko Kushitani; Tetsuro Nakasugi; Takeshi Koshiba; Takumi Oota
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Paper Abstract

We have developed a Character Projection (CP)-type, low-energy Electron-Beam Direct Writing (EBDW) system for a quick turnaround time and mask-less device fabrication of small production lots with a variety of designs. The exposure time has been decreasing because the irradiation time of electrons is being reduced by development of high-sensitivity resist and by decrease in the number of EB shots with the CP method, and the amplifiers of the deflectors have attained specifications required by EBIS. In order to further increase the throughput, overhead time, that is, the exposure waiting time, must be shortened. This paper describes our strategy for reducing the exposure waiting time. The reduction ratio of the exposure waiting time was about 60% and the throughput was increased about 20%.

Paper Details

Date Published: 16 March 2007
PDF: 8 pages
Proc. SPIE 6517, Emerging Lithographic Technologies XI, 65172I (16 March 2007); doi: 10.1117/12.712118
Show Author Affiliations
Kouhei Noguchi, e-BEAM Corp. (Japan)
Katsuhide Watanabe, e-BEAM Corp. (Japan)
Hidetoshi Kinoshita, e-BEAM Corp. (Japan)
Hiroyuki Shinozaki, e-BEAM Corp. (Japan)
Yasushi Kojima, e-BEAM Corp. (Japan)
Satoshi Morita, e-BEAM Corp. (Japan)
Fumihiko Nakamura, e-BEAM Corp. (Japan)
Norihiro Yamaguchi, e-BEAM Corp. (Japan)
Kazuhiko Kushitani, e-BEAM Corp. (Japan)
Tetsuro Nakasugi, Toshiba Corp. (Japan)
Takeshi Koshiba, Toshiba Corp. (Japan)
Takumi Oota, Toshiba Corp. (Japan)

Published in SPIE Proceedings Vol. 6517:
Emerging Lithographic Technologies XI
Michael J. Lercel, Editor(s)

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