Share Email Print
cover

Proceedings Paper

Nonchemically amplified resists for deep-UV lithography
Author(s): Ramakrishnan Ganesan; Sumin Kim; Seul Ki Youn; Youngook Cho; Jei-Moon Yun; Jin-Baek Kim
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

A novel monomer containing a diazoketo functional group was designed and synthesized. Polymers were synthesized using the diazoketo-functionalized monomer and their physical properties were evaluated. The polymers were synthesized by radical copolymerization of cholic acid 3-diazo-3-ethoxycarbonyl-2-oxo-propyl ester methacrylate, methyl methacrylate, and γ-butyrolacton-2-yl methacrylate. These polymers showed 0.7 &mgr;m line and space patterns using a mercury-xenon lamp in a contact printing mode.

Paper Details

Date Published: 2 April 2007
PDF: 5 pages
Proc. SPIE 6519, Advances in Resist Materials and Processing Technology XXIV, 65192J (2 April 2007); doi: 10.1117/12.712113
Show Author Affiliations
Ramakrishnan Ganesan, Korea Advanced Institute of Science and Technology (South Korea)
Sumin Kim, Korea Advanced Institute of Science and Technology (South Korea)
Seul Ki Youn, Korea Advanced Institute of Science and Technology (South Korea)
Youngook Cho, Korea Advanced Institute of Science and Technology (South Korea)
Jei-Moon Yun, Korea Advanced Institute of Science and Technology (South Korea)
Jin-Baek Kim, Korea Advanced Institute of Science and Technology (South Korea)


Published in SPIE Proceedings Vol. 6519:
Advances in Resist Materials and Processing Technology XXIV
Qinghuang Lin, Editor(s)

© SPIE. Terms of Use
Back to Top