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Proceedings Paper

Patterning of biomolecules on a biocompatible nonchemically amplified resist
Author(s): Jin-Baek Kim; Ramakrishnan Ganesan; So Young Yoo; Jae-Hak Choi; Sang Yup Lee
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Paper Abstract

A simple lithographic process in conjunction with a novel biocompatible nonchemically amplified photoresist material was successfully used for the patterning of biomolecules such as cells and proteins. UV light irradiation on selected regions of the nonchemically amplified resist film renders the exposed regions hydrophilic by the formation of carboxylic groups. Mouse fibroblast cells were found to be preferentially aligned and proliferated on the UV light exposed regions of the nonchemically amplified resist film, where carboxylic groups were present. For streptavidin patterning, amine-terminated biotin was linked to the carboxylic groups of the UV light exposed regions, which was further used to bind streptavidin to the UV light exposed regions.

Paper Details

Date Published: 12 April 2007
PDF: 6 pages
Proc. SPIE 6519, Advances in Resist Materials and Processing Technology XXIV, 65191L (12 April 2007); doi: 10.1117/12.712102
Show Author Affiliations
Jin-Baek Kim, Korea Advanced Institute of Science and Technology (South Korea)
Ramakrishnan Ganesan, Korea Advanced Institute of Science and Technology (South Korea)
So Young Yoo, Korea Advanced Institute of Science and Technology (South Korea)
Jae-Hak Choi, Advanced Radiation Technology Institute, Korea Atomic Energy Research Institute (South Korea)
Sang Yup Lee, Korea Advanced Institute of Science and Technology (South Korea)


Published in SPIE Proceedings Vol. 6519:
Advances in Resist Materials and Processing Technology XXIV
Qinghuang Lin, Editor(s)

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