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Proceedings Paper

A report on the modeling efforts in the development of a distributed EUV source for next-generation lithography tools
Author(s): J. B. Spencer; D. A. Alman; B. E. Jurczyk; D. N. Ruzic
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Paper Abstract

The need for a highly scalable, low debris and long lifetime source of Extreme Ultraviolet (EUV) radiation has been well established in the previous years of this conference. Presented here is Starfire Industries' basic concept of a distributed microdischarge EUV light source which emits little debris, while at the same time achieving conversion efficiencies that can be optimized to approach the theoretical physical limit of ~1.6% in a 2% band centered at 13.5nm into 2&pgr; steradians for xenon plasma. Modeling results will be presented based on a variety of techniques including: advanced magneto hydrodynamics calculations that utilize Prism Computational Science's HELIOS-CR, an improved discharge circuit model that interfaces with and extends HELIOS-CR, and ab initio calculations of optimization of EUV collector geometry. These simulations were used together to study the variation of circuit and geometrical parameters of the Starfire microdischarge EUV source array. The results of this parameter study suggest the optimum control conditions that will allow the production of an array of high brightness and high stability EUV sources for image transfer and high-volume lithographic manufacturing.

Paper Details

Date Published: 21 March 2007
PDF: 11 pages
Proc. SPIE 6517, Emerging Lithographic Technologies XI, 65173E (21 March 2007); doi: 10.1117/12.712080
Show Author Affiliations
J. B. Spencer, Univ. of Illinois at Urbana-Champaign (United States)
D. A. Alman, Starfire Industries LLC (United States)
B. E. Jurczyk, Starfire Industries LLC (United States)
D. N. Ruzic, Univ. of Illinois at Urbana-Champaign (United States)

Published in SPIE Proceedings Vol. 6517:
Emerging Lithographic Technologies XI
Michael J. Lercel, Editor(s)

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