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Proceedings Paper

Optimal solutions for the illuminator and final lens pupil coupled distributions beyond the axial symmetry
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Paper Abstract

Since the last decade many efforts in optical lithography are devoted to the improvement of various system components both in order to enhance the optical resolution and to decrease the printing error. Last year we presented a general (i.e. nonparametric) method of the optimization of the pattern-independent components of partially coherent imaging system, such as both the illuminator and the final lens pupil distributions. Here we present further development of the method for the case when printing at only certain orientations is required. We demonstrate the improvements of both CD linearity and the resolution for two important examples. The first one is an optimized stepper, where printing at one orientation is mainly required. The second case is an SLM-based mask writer with four main rotations, such as 0, 45, 90 and 135 degrees. The first experimental results for the second case are demonstrated to be in agreement with the simulation.

Paper Details

Date Published: 27 March 2007
PDF: 8 pages
Proc. SPIE 6520, Optical Microlithography XX, 652038 (27 March 2007); doi: 10.1117/12.712053
Show Author Affiliations
Igor Ivonin, Micronic Laser Systems AB (Sweden)
Tor Sandstrom, Micronic Laser Systems AB (Sweden)

Published in SPIE Proceedings Vol. 6520:
Optical Microlithography XX
Donis G. Flagello, Editor(s)

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