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Latest results from the hyper-NA immersion scanners S609B and S610C
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Paper Abstract

Nikon released the world's first hyper-NA immersion scanner, the NSR-S609B with NA 1.07 at the beginning of 2006. With the highest NA lens using all-refractive optics, a flexible illumination system, and POLANOTM polarized illumination, the NSR-S609B is capable of manufacturing devices with better than 55 nm resolution. In addition, Nikon has announced the release of the NSR-S610C. With the world's highest NA lens (NA=1.30), the S610C can comfortably achieve 45 nm critical layer volume production with k1=0.30. Nikon's proprietary catadipotric lens design for the S610C provides the lowest flare and eliminates lens heating, resulting in stable imaging. Because the S609B and the S610C are built on the same platform, a number of advantages can be realized. First, both the S609B and the S610C utilize a tandem stage optimized for immersion lithography. The tandem stage consists of separate exposure and calibration stages. This allows for continuous flow of immersion water, and for calibration of the exposure tool during wafer exchange. As a result, throughput of greater than 130 wph is achieved, evaporative cooling of the stage during wafer exchange is prevented, and focus drift, baseline changes, and other issues with tool stability are eliminated. In this way, the tandem stage can achieve productivity and accuracy at the same time. In addition to the calibration functions described above, the Integrated Projection Optics Tester (iPot) mounted on the calibration stage can manage the long term performance of the projection optics. By measuring the wavefront aberration, the polarization quality of POLANOTM, and the pupil fill, iPot supports the optimization of the imaging performance. Nikon's polarized illumination system POLANOTM provides improved contrast with no loss of illumination power. This provides increased process margin for 45 nm volume production using immersion lithography. Finally, Nikon's proprietary local fill nozzle installed on the S609B and the S610C has been shown to eliminate immersion defects from bubbles, watermarks, and particles. Various data showing that the NSR-S609B meets requirements for 55nm and below production and the status of the development of Nikon's newest immersion scanner NSR-S610C are introduced here.

Paper Details

Date Published: 26 March 2007
PDF: 12 pages
Proc. SPIE 6520, Optical Microlithography XX, 65201W (26 March 2007); doi: 10.1117/12.712042
Show Author Affiliations
Jun Ishikawa, Nikon Corp. (Japan)
Tomoharu Fujiwara, Nikon Corp. (Japan)
Kenichi Shiraishi, Nikon Corp. (Japan)
Yuuki Ishii, Nikon Corp. (Japan)
Masahiro Nei, Nikon Corp. (Japan)

Published in SPIE Proceedings Vol. 6520:
Optical Microlithography XX
Donis G. Flagello, Editor(s)

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