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Proceedings Paper

Atomic hydrogen cleaning of Ru-capped EUV multilayer mirror
Author(s): Kumi Motai; Hiroaki Oizumi; Shinji Miyagaki; I. Nishiyama; Akira Izumi; Tomoya Ueno; Yasuo Miyazaki; Akira Namiki
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Paper Abstract

Atomic hydrogen cleaning has been developed to reduce the amount of surface oxide on Ru-capped Mo/Si multilayer mirrors for EUVL. Atomic hydrogen generated by a heated W wire catalyzer was supplied to a Ru cap layer that had been lightly oxidized by ECR O2 plasma or EUV irradiation. The effectiveness of atomic hydrogen in deoxidizing it was examined by ex situ AES, XPS, and EUV absolute reflectivity measurements; and it was found that the amount of surface oxide was reduced to the initial level and that the EUV reflectivity of a multilayer degraded by oxidation recovered. In addition, the transport of atomic hydrogen thorough a winding quartz tube was demonstrated to be a promising technique. The actual density of hydrogen radicals was directly measured under various conditions so that the conditions for generating atomic hydrogen could be optimized and the required treatment time shortened.

Paper Details

Date Published: 22 March 2007
PDF: 8 pages
Proc. SPIE 6517, Emerging Lithographic Technologies XI, 65170F (22 March 2007); doi: 10.1117/12.711998
Show Author Affiliations
Kumi Motai, EUV Process Technology Research Laboratory, ASET (Japan)
Hiroaki Oizumi, EUV Process Technology Research Laboratory, ASET (Japan)
Kyushu Institute of Technology (Japan)
Shinji Miyagaki, EUV Process Technology Research Laboratory, ASET (Japan)
I. Nishiyama, EUV Process Technology Research Laboratory, ASET (Japan)
Akira Izumi, Kyushu Institute of Technology (Japan)
Tomoya Ueno, Kyushu Institute of Technology (Japan)
Yasuo Miyazaki, Kyushu Institute of Technology (Japan)
Akira Namiki, Kyushu Institute of Technology (Japan)

Published in SPIE Proceedings Vol. 6517:
Emerging Lithographic Technologies XI
Michael J. Lercel, Editor(s)

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