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Proceedings Paper

Metrology setup to analyze systematic CD variation using scanning electron microscopy and scatterometry in sub-90-nm technology
Author(s): Eun-sang Cho; Jeong-yeol Jang; Jae-Hee Kim; Kee-Ho Kim
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Proc. SPIE 6518, Metrology, Inspection, and Process Control for Microlithography XXI, ; doi: 10.1117/12.711990
Show Author Affiliations
Eun-sang Cho, Dongbu Electronics Co., Ltd. (South Korea)
Jeong-yeol Jang, Dongbu Electronics Co., Ltd. (South Korea)
Jae-Hee Kim, Dongbu Electronics Co., Ltd. (South Korea)
Kee-Ho Kim, Dongbu Electronics Co., Ltd. (South Korea)


Published in SPIE Proceedings Vol. 6518:
Metrology, Inspection, and Process Control for Microlithography XXI
Chas N. Archie, Editor(s)

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