Share Email Print

Proceedings Paper

TEM validation of CD AFM image reconstruction
Author(s): Gregory A. Dahlen; Lars Mininni; Marc Osborn; Hao-Chih Liu; Jason R. Osborne; Bryan Tracy; Amalia del Rosario
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

An extensive test series was undertaken to validate image reconstruction algorithms used with critical dimension atomic force microscopy (CD AFM). Transmission electron microscopy (TEM) was used as the reference metrology system (RMS) with careful attention devoted to both calibration and fiducial marking of TEM sample extraction sites. Shape measurements for the CD probe tips used in the study were acquired both through the use of reentrant image reconstruction and independent (non-destructive) TEM micrographs of the probe tips. TEM images of the tips were acquired using a sample holder that provided the same projection of the tip as presented to the sample surface during AFM scanning. In order to provide meaningful validation of the CD AFM image reconstruction algorithm, widely varying sample morphologies and probe tip shapes were selected for the study. The results indicate a 1 - 2 nm bias between the TEM and CD AFM that is within the uncertainty of the measurements given the Line Width Variation (LWV) of the samples and accuracy of the measurement systems. Moreover, each TEM sample consisted of a grid with multiple features (i.e., 21 to 22 features). High density CD AFM pre-screening of the sample allowed precise locating of the TEM extraction site by correlating multiple feature profile shapes. In this way, the LWV and height of the sample were used to match measurement location for the two independent metrology systems.

Paper Details

Date Published: 5 April 2007
PDF: 12 pages
Proc. SPIE 6518, Metrology, Inspection, and Process Control for Microlithography XXI, 651818 (5 April 2007); doi: 10.1117/12.711943
Show Author Affiliations
Gregory A. Dahlen, Veeco Instruments, Inc. (United States)
Lars Mininni, Veeco Instruments, Inc. (United States)
Marc Osborn, Veeco Instruments, Inc. (United States)
Hao-Chih Liu, Veeco Instruments, Inc. (United States)
Jason R. Osborne, Veeco Instruments, Inc. (United States)
Bryan Tracy, Spansion, Inc. (United States)
Amalia del Rosario, Spansion, Inc. (United States)

Published in SPIE Proceedings Vol. 6518:
Metrology, Inspection, and Process Control for Microlithography XXI
Chas N. Archie, Editor(s)

© SPIE. Terms of Use
Back to Top