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Proceedings Paper

Spin-on organic hardmask materials in 70nm devices
Author(s): Chang-Il Oh; Dong-Seon Uh; Do-Hyeon Kim; Jin-Kuk Lee; Hui-Chan Yun; Irina Nam; Min-Soo Kim; Kyong-Ho Yoon; Kyung-Hee Hyung; Nataliya Tokareva; Hwan-Sung Cheon; Jong-Seob Kim; Tu-Won Chang
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Paper Abstract

In ArF lithography for < 90nm L/S, amorphous carbon layer (ACL) deposition becomes inevitable process because thin ArF resist itself can not provide suitable etch selectivity to sub-layers. One of the problems of ACL hardmask is surface particles which are more problematic in mass production. Limited capacity, high cost-of-ownership, and low process efficiency also make ACL hardmask a dilemma which can not be ignored by device makers. One of the answers to these problems is using a spin-on organic hardmask material instead of ACL hardmask. Therefore, several processes including bi-layer resist process (BLR), tri-layer resist process (TLR), and multi-layer resist process (MLR) have been investigated. In this paper, we have described spin-on organic hardmask materials applicable to 70nm memory devices. Applications to tri-layer resist process (TLR) were investigated in terms of photo property, etch property and process compatibility. Based on the test results described in this paper, our spin-on hardmask materials are expected to be used in mass production.

Paper Details

Date Published: 2 April 2007
PDF: 10 pages
Proc. SPIE 6519, Advances in Resist Materials and Processing Technology XXIV, 65192R (2 April 2007); doi: 10.1117/12.711720
Show Author Affiliations
Chang-Il Oh, Cheil Industries, Inc. (South Korea)
Dong-Seon Uh, Cheil Industries, Inc. (South Korea)
Do-Hyeon Kim, Cheil Industries, Inc. (South Korea)
Jin-Kuk Lee, Cheil Industries, Inc. (South Korea)
Hui-Chan Yun, Cheil Industries, Inc. (South Korea)
Irina Nam, Cheil Industries, Inc. (South Korea)
Min-Soo Kim, Cheil Industries, Inc. (South Korea)
Kyong-Ho Yoon, Cheil Industries, Inc. (South Korea)
Kyung-Hee Hyung, Cheil Industries, Inc. (South Korea)
Nataliya Tokareva, Cheil Industries, Inc. (South Korea)
Hwan-Sung Cheon, Cheil Industries, Inc. (South Korea)
Jong-Seob Kim, Cheil Industries, Inc. (South Korea)
Tu-Won Chang, Cheil Industries, Inc. (South Korea)


Published in SPIE Proceedings Vol. 6519:
Advances in Resist Materials and Processing Technology XXIV
Qinghuang Lin, Editor(s)

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