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Proceedings Paper

Novel 193-nm positive photoresist composed of ester acetal polymer without phenyl group
Author(s): Liyuan Wang; Xiaoxiao Zhai; Yongen Huo
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Paper Abstract

1,3-adamantanedicarboxylic acid and acrylpimaric acid were reacted with an aliphatic divinyl ether, 1,4-cyclohexanedimethanol divinyl ether, to give novel ester acetal polymers without phenyl group. These polymers can be dissolved in common solvents and possess high thermal stability. The ester acetal polymer can be quickly decomposed at the presence of strong acid generated by PAG above 100°C and become easily soluble in dilute aqueous base. Two-component photopolymer consisting of the ester acetal polymer and PAG can be used as positive photoresists. The polymer derived from 1,3-adamantanedicarboxylic acid displayed higher transparency at 193 nm and can be used for 193 nm photoresist.

Paper Details

Date Published: 2 April 2007
PDF: 8 pages
Proc. SPIE 6519, Advances in Resist Materials and Processing Technology XXIV, 65192H (2 April 2007); doi: 10.1117/12.711703
Show Author Affiliations
Liyuan Wang, Beijing Normal Univ. (China)
Xiaoxiao Zhai, Beijing Normal Univ. (China)
Yongen Huo, Beijing Normal Univ. (China)


Published in SPIE Proceedings Vol. 6519:
Advances in Resist Materials and Processing Technology XXIV
Qinghuang Lin, Editor(s)

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