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Proceedings Paper

Two-component photoresists based on acidolytic cleavage of novel ester acetal polymer
Author(s): Liyuan Wang; Zhanxing Chu; Long Cheng
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Paper Abstract

The reaction of acrylpimaric acid and several divinyl ether compounds, including 1,3-Bis(2-(vinyloxy)ethoxy)benzene, 2,2-bis(4-[2-(vinyloxy)ethoxy]phenyl)propane, and 1,4-Bis(2-(vinyloxy)ethoxy)benzene, can take place in the presence of organic solvents to form novel ester acetal polymer with the average molecular weight of 4000-6000(Mn) measured by GPC. These polymers can be easily dissolved in common solvents and show high thermal stability. The ester acetal polymers can be quickly acidolyzed at the presence of strong acid generated by PAG above 100oC and become easily soluble in dilute aqueous base. Two-component positive photoresists can be formed by the ester acetal polymer and PAG. The lithographic performance of the resist material composed of the ester acetal polymer and a sulfonium triflate PAG was studied on i-line exposure instrument. Clear pattern with 2 &mgr;m resolution was obtained and the photosensitivity was below 20mj/cm2.

Paper Details

Date Published: 2 April 2007
PDF: 8 pages
Proc. SPIE 6519, Advances in Resist Materials and Processing Technology XXIV, 65192I (2 April 2007); doi: 10.1117/12.711701
Show Author Affiliations
Liyuan Wang, Beijing Normal Univ. (China)
Zhanxing Chu, Beijing Normal Univ. (China)
Long Cheng, Beijing Normal Univ. (China)


Published in SPIE Proceedings Vol. 6519:
Advances in Resist Materials and Processing Technology XXIV
Qinghuang Lin, Editor(s)

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