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Proceedings Paper

New inline AFM metrology tool suited for LSI manufacturing at the 45-nm node and beyond
Author(s): Manabu Edamura; Yuichi Kunitomo; Takafumi Morimoto; Satoshi Sekino; Toru Kurenuma; Yukio Kembo; Masahiro Watanabe; Shuichi Baba; Kishio Hidaka
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Paper Abstract

A new inline metrology tool utilizing atomic force microscope (AFM) suited for LSI manufacturing at the 45-nm node and beyond has been developed. The developed AFM is featuring both of high-speed wafer processing (throughput: 30 WPH) and high-precision measurement (static repeatability: 0.5nm in 3σ). Several types of carbon nanotube (CNT) probes specially designed for the AFM have also been developed. The combination of Advanced StepInTM mode and CNT probes realizes high precision measurement for high-aspect-ratio samples such as photoresist patterns. In Advanced StepInTM mode, a probe tip approaches and contacts a sample surface, and then moves away from the surface and toward a new measurement position. A series of these actions is performed in a short time (3.8 ms for single measurement point) full-automatically. Advanced StepInTM mode not only ensures gentle probe tip contact and precise measurement of high aspect ratio samples, but also minimum tip wear. CNT probes can provide long term performance, while eliminating the need for probe exchange. The developed AFM also realizes flatness measurement of 10-nm level in a wide area of 40x40-mm maximum. This performance is sufficient for the evaluation of CMP processes at the 45-nm node.

Paper Details

Date Published: 5 April 2007
PDF: 9 pages
Proc. SPIE 6518, Metrology, Inspection, and Process Control for Microlithography XXI, 65183M (5 April 2007); doi: 10.1117/12.711676
Show Author Affiliations
Manabu Edamura, Hitachi Kenki FineTech Co., Ltd. (Japan)
Yuichi Kunitomo, Hitachi Kenki FineTech Co., Ltd. (Japan)
Takafumi Morimoto, Hitachi Kenki FineTech Co., Ltd. (Japan)
Satoshi Sekino, Hitachi Kenki FineTech Co., Ltd. (Japan)
Toru Kurenuma, Hitachi Kenki FineTech Co., Ltd. (Japan)
Yukio Kembo, Hitachi Kenki FineTech Co., Ltd. (Japan)
Masahiro Watanabe, Hitachi, Ltd. (Japan)
Shuichi Baba, Hitachi, Ltd. (Japan)
Kishio Hidaka, Hitachi, Ltd. (Japan)


Published in SPIE Proceedings Vol. 6518:
Metrology, Inspection, and Process Control for Microlithography XXI
Chas N. Archie, Editor(s)

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