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Proceedings Paper

Single component chemically-amplified resist based on dehalogenation of polymer
Author(s): Hiroki Yamamoto; Takahiro Kozawa; Seiichi Tagawa; Katsumi Ohmori; Mitsuru Sato; Hiroji Komano
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Paper Abstract

For chemically amplified resists which generally consists of a polymer and an acid generator, the homogeneity of resist materials is a serious issue. The incorporation of acid generators into polymers via covalent bonds has attracted much attention because it removes the compatibility problem of acid generators with polymers. In this study, we designed a single-component chemically amplified resist, taking advantage of the difference of reaction mechanisms between electron beam and photoresists. The designed resist has a hydroxyl group as a proton source and halogen atoms as an anion source for acid generation. The developed resist showed an excellent performance.

Paper Details

Date Published: 23 March 2007
PDF: 7 pages
Proc. SPIE 6519, Advances in Resist Materials and Processing Technology XXIV, 65192G (23 March 2007); doi: 10.1117/12.711656
Show Author Affiliations
Hiroki Yamamoto, Osaka Univ. (Japan)
Takahiro Kozawa, Osaka Univ. (Japan)
Seiichi Tagawa, Osaka Univ. (Japan)
Katsumi Ohmori, Tokyo Ohka Kogyo Co., Ltd. (Japan)
Mitsuru Sato, Tokyo Ohka Kogyo Co., Ltd. (Japan)
Hiroji Komano, Tokyo Ohka Kogyo Co., Ltd. (Japan)

Published in SPIE Proceedings Vol. 6519:
Advances in Resist Materials and Processing Technology XXIV
Qinghuang Lin, Editor(s)

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