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Proceedings Paper

Distributed model calibration using Levenberg-Marquardt algorithm
Author(s): Mark Lu; Liang Zhu; Li Ling; Gary Zhang; Walter Chan; Xin Zhou
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Paper Abstract

The number of tunable parameters increases dramatically as we push forward to the next node of hyper-NA immersion lithography. It is very important to keep the lithographic process model calibration time under control, and its end result insensitive to either the starting point in the parameter space or the noise in the measurement data. For minimizing the least-squares error of a multivariate non-linear system, the industry standard is the Levenberg-Marquardt algorithm. We describe a distributed computing technique that is natural to the algorithm, and easy to implement in a cluster of computers. Applying this technique to calibrating lithographic process model, we can achieve robust optimization results in nearly constant calibration time.

Paper Details

Date Published: 26 March 2007
PDF: 8 pages
Proc. SPIE 6520, Optical Microlithography XX, 65203C (26 March 2007); doi: 10.1117/12.711564
Show Author Affiliations
Mark Lu, Grace Semiconductor Manufacturing Corp. (China)
Liang Zhu, Grace Semiconductor Manufacturing Corp. (China)
Li Ling, Anchor Semiconductor Inc. (China)
Gary Zhang, Anchor Semiconductor Inc. (China)
Walter Chan, Anchor Semiconductor Inc. (United States)
Xin Zhou, Anchor Semiconductor Inc. (United States)


Published in SPIE Proceedings Vol. 6520:
Optical Microlithography XX
Donis G. Flagello, Editor(s)

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