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Proceedings Paper

Lithography process control using scatterometry metrology and semi-physical modeling
Author(s): Kevin Lensing; Jason Cain; Amogh Prabhu; Alok Vaid; Robert Chong; Richard Good; Bruno LaFontaine; Oleg Kritsun
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Paper Abstract

In this paper, results and analysis are presented from Advanced Micro Devices' (AMD) efforts at calculating lithography dose and focus parameters using scatterometry metrology and semi-physical CD models. The system takes advantage of the accurate and precise top and bottom CD data produced by scatterometry to differentiate dose and focus variation. To build the lithography process model, scatterometry data is generated for each field of a focus-exposure matrix (FEM) wafer, and the resulting top and bottom CD data is used to fit the parameters of series expansions relating CD to dose and focus. When new CD data is generated, the models can be inverted to solve for dose and focus independently. Our methodology employs a flexible modeling and inversion approach in an attempt to make the technique applicable to any production film stack and any line spacing regime. The quality of the inversion results are highly correlated to the degree of focus observability present in the system. Our results will show how a series of litho process with varied film stacks and line/space ratios respond to this technique, and we will report some best practices for a variety of use cases ranging from equipment characterization to focus monitoring on product.

Paper Details

Date Published: 4 April 2007
PDF: 12 pages
Proc. SPIE 6518, Metrology, Inspection, and Process Control for Microlithography XXI, 651804 (4 April 2007); doi: 10.1117/12.711548
Show Author Affiliations
Kevin Lensing, Advanced Micro Devices (United States)
Jason Cain, Advanced Micro Devices (United States)
Amogh Prabhu, Advanced Micro Devices (United States)
Alok Vaid, Advanced Micro Devices (United States)
Robert Chong, Advanced Micro Devices (United States)
Richard Good, Advanced Micro Devices (United States)
Bruno LaFontaine, Advanced Micro Devices (United States)
Oleg Kritsun, Advanced Micro Devices (United States)

Published in SPIE Proceedings Vol. 6518:
Metrology, Inspection, and Process Control for Microlithography XXI
Chas N. Archie, Editor(s)

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