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Proceedings Paper

A rigorous method to determine printability of a target layout
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Paper Abstract

We present a necessary condition for an arbitrary 2-dimensional pattern to be printable by optical projection lithography. We call a pattern printable if it satisfies a given set of edge-placement tolerances for a given lithography model and process-window. The test can be made specific to a lithography model, or it can be made generic for a wavelength and numerical aperture. In the generic form, if a pattern is found to be not printable, the conclusion is valid for all RET technologies except for non-linear techniques such as litho-etch-litho-etch double-patterning and multi-photon lithography. The test determines printability of a target layout without applying RET/OPC.

Paper Details

Date Published: 21 March 2007
PDF: 12 pages
Proc. SPIE 6521, Design for Manufacturability through Design-Process Integration, 652112 (21 March 2007); doi: 10.1117/12.711530
Show Author Affiliations
Bayram Yenikaya, Invarium, Inc. (United States)
Apo Sezginer, Invarium, Inc. (United States)


Published in SPIE Proceedings Vol. 6521:
Design for Manufacturability through Design-Process Integration
Alfred K.K. Wong; Vivek K. Singh, Editor(s)

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