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Proceedings Paper

Model-based assist feature generation
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Paper Abstract

We optimize a continuous-tone photomask to meet a set of edge-placement tolerances and 2-D image fidelity requirements, for a set of dose and defocus values. The resulting continuous tone mask, although not realizable, indicates where to place assist features and their polarity. This algorithm derives assist features from first principles: when the mask is optimized for best focus, the optimal continuous-tone photomask does not have any features that resemble assist features. When the mask is optimized for best focus and a defocus condition, the optimal continuous-tone photomask spontaneously grows assist features. The continuous-tone photomask also has features that can be identified as phase windows. Polygonal, quantized assist features are extracted from the optimal continuous-tone photomask.

Paper Details

Date Published: 20 March 2007
PDF: 8 pages
Proc. SPIE 6521, Design for Manufacturability through Design-Process Integration, 652102 (20 March 2007); doi: 10.1117/12.711504
Show Author Affiliations
Bayram Yenikaya, Invarium, Inc. (United States)
Apo Sezginer, Invarium, Inc. (United States)


Published in SPIE Proceedings Vol. 6521:
Design for Manufacturability through Design-Process Integration
Alfred K.K. Wong; Vivek K. Singh, Editor(s)

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