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Proceedings Paper

Impact of thin film metrology on the lithographic performance of 193-nm bottom antireflective coatings
Author(s): Chris A. Mack; Dale Harrison; Cristian Rivas; Phillip Walsh
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Paper Abstract

The performance needs of a bottom antireflection coating (BARC) used in advanced optical lithography are extremely demanding, with reflectivities as low as 0.1% and even lower often required. BARC thickness and complex refractive index values (n = n + iκ) must be highly optimized, requiring accurate knowledge of the BARC, resist and substrate optical properties. In this paper, we have performed a theoretical analysis of the BARC optimization process with respect to the propagation of BARC n and κ measurement errors. For several realistic cases, specifications on the measurement accuracy of these optical parameters will be derived and the lithographic consequences of BARC metrology errors will be explored. Approaches to improving the measurement of BARC thickness and refractive index will be suggested.

Paper Details

Date Published: 5 April 2007
PDF: 16 pages
Proc. SPIE 6518, Metrology, Inspection, and Process Control for Microlithography XXI, 65181C (5 April 2007); doi: 10.1117/12.711488
Show Author Affiliations
Chris A. Mack, (United States)
Dale Harrison, MetroSol, Inc. (United States)
Cristian Rivas, MetroSol, Inc. (United States)
Phillip Walsh, MetroSol, Inc. (United States)

Published in SPIE Proceedings Vol. 6518:
Metrology, Inspection, and Process Control for Microlithography XXI
Chas N. Archie, Editor(s)

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