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Proceedings Paper

Application of the Energetiq EQ-10 electrodeless Z-Pinch EUV light source in outgassing and exposure of EUV photoresist
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Paper Abstract

Formulating high sensitivity and high resolution EUV Resists is a critical issue gating the adoption of EUV lithography. The ability of resist manufacturers to quickly screen outgassing rates and sensitivity of EUV resists will facilitate faster formulation of a production-ready EUV photoresist. The high power and low cost per watt of the Energetiq EQ-10 light source enables relatively simple designs without complex optics to deliver relevant data efficiently. Because the source operates without electrodes, a significant source of contamination is removed, further simplifying the design of exposure systems. Data will be presented from two prototype exposure systems. The first, in operation at Osaka University, Japan, has been used for in-band flood exposure experiments to test resist sensitivity and develop photochemical modeling capability. The second, in operation at SUNY-Albany, integrates exposure/sensitivity with outgassing measurements (GC/MS and RGA) and also allows direct tests of mirror contamination, at power densities near those required for Beta exposure tools. Features of both experiments have been integrated into a commercial device. Details of this tool -- the Litho Tech Japan EUVES-7000 system for resist outgassing and exposure -- will be presented at this meeting.

Paper Details

Date Published: 15 March 2007
PDF: 10 pages
Proc. SPIE 6517, Emerging Lithographic Technologies XI, 65171W (15 March 2007); doi: 10.1117/12.711457
Show Author Affiliations
Paul A. Blackborow, Energetiq Technology, Inc. (United States)
Deborah S. Gustafson, Energetiq Technology, Inc. (United States)
Donald K. Smith, Energetiq Technology, Inc. (United States)
Matthew M. Besen, Energetiq Technology, Inc. (United States)
Stephen F. Horne, Energetiq Technology, Inc. (United States)
Robert J. D'Agostino, Energetiq Technology, Inc. (United States)
Youichi Minami, Litho Tech Japan Co. (Japan)
Gregory Denbeaux, SUNY, Albany (United States)


Published in SPIE Proceedings Vol. 6517:
Emerging Lithographic Technologies XI
Michael J. Lercel, Editor(s)

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