Share Email Print

Proceedings Paper

Study of 193nm resist degradation under various etch chemistries
Author(s): Arnaud Bazin; Michael May; Erwine Pargon; Benedicte Mortini; Olivier Joubert
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

The effectivity of 193nm photoresists as dry etch masks is becoming more and more critical as the size of integrated devices shrinks. 193nm resists are known to be much less resistant to dry etching than 248nm resists based on a poly(hydroxystyrene) polymer backbone. The decrease in the resist film budget implies a better etch resistance to use single layer 193nm photoresists for the 65nm node and beyond. In spite of significant improvements made in the past decade regarding the etch resistance of photoresists, much of the fundamental chemistry and physics that could explain the behaviour of these materials has to be better understood. Such knowledge is necessary in order to propose materials and etch processes for the next technology nodes (45nm and below). In this paper, we report our studies on the etch behaviour of different 193nm resist materials as a function of etch chemistry. In a first step, we focus our attention on the interactions between photoresists and the reactive species of a plasma during a dry etch step. Etch experiments were carried out in a DPS (Decoupled Plasma Source) high density chamber. The gas chemistry in particular was changed to check the role of the plasma reactive species on the resist. O2, Cl2, CF4, HBr and Ar gas were used. Etch rates and chemical modifications of different materials were quantified by ellipsometry, Fourier Transformed Infrared Spectroscopy (FTIR), and X-Ray Photoelectrons Spectroscopy (XPS). We evaluated different materials including 248nm model polymer backbones (pure PHS or functionalized PHS), and 193nm model polymers (PMMA and acrylate polymers) or resist formulations. Besides the influence of resist chemistry, the impact of plasma parameters was addressed.

Paper Details

Date Published: 12 April 2007
PDF: 9 pages
Proc. SPIE 6519, Advances in Resist Materials and Processing Technology XXIV, 65192N (12 April 2007); doi: 10.1117/12.711415
Show Author Affiliations
Arnaud Bazin, STMicroelectronics (France)
Lab. d'Electronique de Technologie de l'Information, CNRS (France)
Michael May, STMicroelectronics (France)
Erwine Pargon, Lab. d'Electronique de Technologie de l'Information, CNRS (France)
Benedicte Mortini, STMicroelectronics (France)
Olivier Joubert, Lab. d'Electronique de Technologie de l'Information, CNRS (France)

Published in SPIE Proceedings Vol. 6519:
Advances in Resist Materials and Processing Technology XXIV
Qinghuang Lin, Editor(s)

© SPIE. Terms of Use
Back to Top