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Proceedings Paper

Long-term durability of a Ru capping layer for EUVL projection optics by introducing ethanol
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Paper Abstract

The inhibition of contamination of Ru-capped Mo/Si multilayer mirrors was systematically investigated by introducing ethanol into a controlled vacuum that mainly consisted of water vapor. Water vapor was introduced up to several partial pressures of 1.0X10-7 to 3.8X10-5 Pa. At the lowest ethanol pressure, the same degree of reflectance degradation as in the water-only case was observed. However, reflectance degradation was suppressed at ethanol pressures higher than 2.0X10-6 Pa. In the condition of ethanol pressure of 2.0X10-6 Pa, the long-term durability of a Ru capping layer was investigated up to an EUV dose of 6000 J/mm2. This dose was corresponded to the 1-year use of a mirror which would be irradiated by the maximum power expected in actual EUVL tools. As a result of this investigation, it was found that reflectance degradation of a Ru capping layer was suppressed to less than 0.5% until 6000 J/mm2 by introducing ethanol.

Paper Details

Date Published: 21 March 2007
PDF: 11 pages
Proc. SPIE 6517, Emerging Lithographic Technologies XI, 651731 (21 March 2007); doi: 10.1117/12.711364
Show Author Affiliations
Yukinobu Kakutani, Univ. of Hyogo (Japan)
Masahito Niibe, Univ. of Hyogo (Japan)
Yoshio Gomei, Canon Inc. (Japan)
Hiromitsu Takase, Extreme Ultraviolet Lithography System Development Association (Japan)
Shigeru Terashima, Extreme Ultraviolet Lithography System Development Association (Japan)
Shuichi Matsunari, Extreme Ultraviolet Lithography System Development Association (Japan)
Takashi Aoki, Extreme Ultraviolet Lithography System Development Association (Japan)
Yasuaki Fukuda, Extreme Ultraviolet Lithography System Development Association (Japan)


Published in SPIE Proceedings Vol. 6517:
Emerging Lithographic Technologies XI
Michael J. Lercel, Editor(s)

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