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Proceedings Paper

Immersion exposure tool for the 45-nm HP mass production
Author(s): Hiroaki Kubo; Hideo Hata; Fumio Sakai; Nobuyoshi Deguchi; Takehiko Iwanaga; Takeaki Ebihara
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Paper Abstract

Canon has renewed its platform of exposure tools. The new platform, the FPA-7000, is designed to cover multiple generations. The lens performance of the FPA-7000AS5 achieves less than 6m&lgr;, while that of the AS7 is estimated to be less than 4m&lgr;. The illumination performance meets the target required for the 45nm node. The in-situ aberration monitor, called iPMI, attains the measurement repeatability of 1.45m&lgr;. Focus and overlay units have improved process robustness. A solution tool for optimization is introduced to be connected with the FPA-7000. Moreover, latest studies of immersion, such as nozzle pressure, temperature control and defect inspection result are reported, and we also discuss the possibility of high-refractive-index immersion.

Paper Details

Date Published: 26 March 2007
PDF: 10 pages
Proc. SPIE 6520, Optical Microlithography XX, 65201X (26 March 2007); doi: 10.1117/12.711360
Show Author Affiliations
Hiroaki Kubo, Canon Inc. (Japan)
Hideo Hata, Canon Inc. (Japan)
Fumio Sakai, Canon Inc. (Japan)
Nobuyoshi Deguchi, Canon Inc. (Japan)
Takehiko Iwanaga, Canon Inc. (Japan)
Takeaki Ebihara, Canon Inc. (Japan)

Published in SPIE Proceedings Vol. 6520:
Optical Microlithography XX
Donis G. Flagello, Editor(s)

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